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Semiconductor (SiC)

The Challenge

Why This Material Is Demanding

💎

Extreme hardness (9.5 Mohs)

Second only to diamond — causes fast wire wear and slow cutting with conventional methods.

🔬

Subsurface damage (SSD)

Blade and poor wire control leave SSD that drives polishing cost and yield loss.

📏

Small kerf requirement

Expensive SiC means every micron of kerf is lost material and margin.

🔄

200 mm transition

The industry is scaling from 150 mm to 200 mm boules and wafers.

Our Solution

How Prominer CNC Approaches It

Endless Wire Saw (HXB Series)

High-speed endless loop wire, precision tension ±0.5 N and CNC multi-stage cutting for low SSD on 150/200 mm SiC.

Endless Wire Saws →

Lab Wire Saw (HXV2020L-C)

R&D, 200 mm wafer development and university research with programmable angles.

Lab Wire Saws →

Typical Parameters

Reference Cutting Window

Parameter Value
Wire diameter 0.20–0.30 mm
Wire speed 5–15 m/s
Feed rate 0.1–0.3 mm/min
Wire tension ±0.5 N
Typical kerf loss 0.28–0.35 mm
Target SSD <5 µm
Target surface Ra <0.5 µm

Proven Results

Real-World Outcomes

SiC

American SiC Device Maker

Kerf reduced 33% (180→120 µm), 96%+ yield.

$890K/yr Saved

SiC

Korean EV SiC Power Module

Yield improved 85%→95%, TTV below 5 µm.

Yield 95%

SiC

German SiC R&D Lab

200 mm wafer development, surface Ra below 0.5 µm.

Ra <0.5 µm

Cutting this material? Let’s benchmark it.

Send us a sample and we’ll run a free test cut and return optimal parameters plus a sample.

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